Copolymers, polymer resin composition for buffer layer method of forming a pattern using the same and method of manufacturing a capacitor using the same

12 3 16 The invention is directed to particular polymer compositions that may be generally characterized by the formula: wherein the variables L, M and N represent the relative molar fractions of the monomers and satisfy the expressions 0

Bibliographische Detailangaben

Hauptverfasser:	Ahn, Sun-Yul, Kang, Kyong-Rim, Kim, Tae-Sung, Kim, Young-Ho, Lee, Jung-Hoon
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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