Method and apparatus for controlling beam current uniformity in an ion implanter

An electrode assembly for use with an ion source chamber or as part of an ion implanter processing system to provide a uniform ion beam profile. The electrode assembly includes an electrode having an extraction slot with length L aligned with an aperture of the ion source chamber for extracting an i...

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Bibliographische Detailangaben

Hauptverfasser:	Dorai, Rajesh, Kurunczi, Peter F, Perel, Alexander S, Platow, Wilhelm P
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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