Secure nano-mask

A close-fitting face mask made of woven or non-woven material having a fitted nose area with a nose-bridge contact and a nose-bridge recess or space, a nose upper part extending from the nose-bridge contact at the mid point of the bridge of the wearer's nose to the level of the lower eyelid, a...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: Chiam, Kia Chee
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Chiam, Kia Chee
description A close-fitting face mask made of woven or non-woven material having a fitted nose area with a nose-bridge contact and a nose-bridge recess or space, a nose upper part extending from the nose-bridge contact at the mid point of the bridge of the wearer's nose to the level of the lower eyelid, a chin part with a recess or space extending below the wearer's chin, and attachment straps made of elastic or flexible material including upper straps, one each side, attached to the nose upper part and passing above the upper part of the wearer's ear, and lower straps, one each side, attached to the pivot or neutral point of the mask and passing below the wearer's ear.
format Patent
fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07762257</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07762257</sourcerecordid><originalsourceid>FETCH-uspatents_grants_077622573</originalsourceid><addsrcrecordid>eNrjZBAITk0uLUpVyEvMy9fNTSzO5mFgTUvMKU7lhdLcDApuriHOHrqlxQWJJal5JcXx6UWJIMrA3NzMyMjU3JgIJQCF_x_5</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Secure nano-mask</title><source>USPTO Issued Patents</source><creator>Chiam, Kia Chee</creator><creatorcontrib>Chiam, Kia Chee ; i-Nano Industries Pte Ltd</creatorcontrib><description>A close-fitting face mask made of woven or non-woven material having a fitted nose area with a nose-bridge contact and a nose-bridge recess or space, a nose upper part extending from the nose-bridge contact at the mid point of the bridge of the wearer's nose to the level of the lower eyelid, a chin part with a recess or space extending below the wearer's chin, and attachment straps made of elastic or flexible material including upper straps, one each side, attached to the nose upper part and passing above the upper part of the wearer's ear, and lower straps, one each side, attached to the pivot or neutral point of the mask and passing below the wearer's ear.</description><language>eng</language><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7762257$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,802,885,64039</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7762257$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Chiam, Kia Chee</creatorcontrib><creatorcontrib>i-Nano Industries Pte Ltd</creatorcontrib><title>Secure nano-mask</title><description>A close-fitting face mask made of woven or non-woven material having a fitted nose area with a nose-bridge contact and a nose-bridge recess or space, a nose upper part extending from the nose-bridge contact at the mid point of the bridge of the wearer's nose to the level of the lower eyelid, a chin part with a recess or space extending below the wearer's chin, and attachment straps made of elastic or flexible material including upper straps, one each side, attached to the nose upper part and passing above the upper part of the wearer's ear, and lower straps, one each side, attached to the pivot or neutral point of the mask and passing below the wearer's ear.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZBAITk0uLUpVyEvMy9fNTSzO5mFgTUvMKU7lhdLcDApuriHOHrqlxQWJJal5JcXx6UWJIMrA3NzMyMjU3JgIJQCF_x_5</recordid><startdate>20100727</startdate><enddate>20100727</enddate><creator>Chiam, Kia Chee</creator><scope>EFH</scope></search><sort><creationdate>20100727</creationdate><title>Secure nano-mask</title><author>Chiam, Kia Chee</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_077622573</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2010</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Chiam, Kia Chee</creatorcontrib><creatorcontrib>i-Nano Industries Pte Ltd</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Chiam, Kia Chee</au><aucorp>i-Nano Industries Pte Ltd</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Secure nano-mask</title><date>2010-07-27</date><risdate>2010</risdate><abstract>A close-fitting face mask made of woven or non-woven material having a fitted nose area with a nose-bridge contact and a nose-bridge recess or space, a nose upper part extending from the nose-bridge contact at the mid point of the bridge of the wearer's nose to the level of the lower eyelid, a chin part with a recess or space extending below the wearer's chin, and attachment straps made of elastic or flexible material including upper straps, one each side, attached to the nose upper part and passing above the upper part of the wearer's ear, and lower straps, one each side, attached to the pivot or neutral point of the mask and passing below the wearer's ear.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_uspatents_grants_07762257
source USPTO Issued Patents
title Secure nano-mask
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T13%3A29%3A31IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Chiam,%20Kia%20Chee&rft.aucorp=i-Nano%20Industries%20Pte%20Ltd&rft.date=2010-07-27&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E07762257%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true