Apparatus for use in semiconductor wafer processing for laterally displacing individual semiconductor devices away from one another

A chip-scale or wafer-level-package, having passivation layers on substantially all surfaces thereof to form a hermetically sealed-package, is provided. The package may be formed by disposing a first passivation layer on the passive or backside surface of a semiconductor wafer. The semiconductor waf...

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description A chip-scale or wafer-level-package, having passivation layers on substantially all surfaces thereof to form a hermetically sealed-package, is provided. The package may be formed by disposing a first passivation layer on the passive or backside surface of a semiconductor wafer. The semiconductor wafer may be attached to a flexible membrane and diced, such as by a wafer saw, to separate the semiconductor devices. Once diced, the flexible membrane may be stretched so as to laterally displace the individual semiconductor devices away from one another and substantially expose the side edges thereof. Once the side edges of the semiconductor devices are exposed, a passivation layer may be formed on the side edges and active surfaces of the devices. A portion of the passivation layer over the active surface of each semiconductor device may be removed so as to expose conductive elements formed therebeneath.
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fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07656012</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07656012</sourcerecordid><originalsourceid>FETCH-uspatents_grants_076560123</originalsourceid><addsrcrecordid>eNqNjcEKwjAQRHvxIOo_7A8IVVHPIoof4F2WZFMX0iTsJi09--O24smTp4GZNzPz6nVKCQVzUXBRoCgBB1Bq2cRgi8mj2aMjgSTRkCqH5kN6zCTo_QCWNXk0U8DBcse2oP-ZsNTx2AbscQAnsYUYCDDE_CRZVjOHXmn11UUF18v9fFsXTeNLyPpoBCepj4f9od5sd38gb4q_TI4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Apparatus for use in semiconductor wafer processing for laterally displacing individual semiconductor devices away from one another</title><source>USPTO Issued Patents</source><creator>Doan, Trung T</creator><creatorcontrib>Doan, Trung T ; Micron Technology, Inc</creatorcontrib><description>A chip-scale or wafer-level-package, having passivation layers on substantially all surfaces thereof to form a hermetically sealed-package, is provided. The package may be formed by disposing a first passivation layer on the passive or backside surface of a semiconductor wafer. The semiconductor wafer may be attached to a flexible membrane and diced, such as by a wafer saw, to separate the semiconductor devices. Once diced, the flexible membrane may be stretched so as to laterally displace the individual semiconductor devices away from one another and substantially expose the side edges thereof. Once the side edges of the semiconductor devices are exposed, a passivation layer may be formed on the side edges and active surfaces of the devices. A portion of the passivation layer over the active surface of each semiconductor device may be removed so as to expose conductive elements formed therebeneath.</description><language>eng</language><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7656012$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,776,798,881,64015</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7656012$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Doan, Trung T</creatorcontrib><creatorcontrib>Micron Technology, Inc</creatorcontrib><title>Apparatus for use in semiconductor wafer processing for laterally displacing individual semiconductor devices away from one another</title><description>A chip-scale or wafer-level-package, having passivation layers on substantially all surfaces thereof to form a hermetically sealed-package, is provided. The package may be formed by disposing a first passivation layer on the passive or backside surface of a semiconductor wafer. The semiconductor wafer may be attached to a flexible membrane and diced, such as by a wafer saw, to separate the semiconductor devices. Once diced, the flexible membrane may be stretched so as to laterally displace the individual semiconductor devices away from one another and substantially expose the side edges thereof. Once the side edges of the semiconductor devices are exposed, a passivation layer may be formed on the side edges and active surfaces of the devices. A portion of the passivation layer over the active surface of each semiconductor device may be removed so as to expose conductive elements formed therebeneath.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNqNjcEKwjAQRHvxIOo_7A8IVVHPIoof4F2WZFMX0iTsJi09--O24smTp4GZNzPz6nVKCQVzUXBRoCgBB1Bq2cRgi8mj2aMjgSTRkCqH5kN6zCTo_QCWNXk0U8DBcse2oP-ZsNTx2AbscQAnsYUYCDDE_CRZVjOHXmn11UUF18v9fFsXTeNLyPpoBCepj4f9od5sd38gb4q_TI4</recordid><startdate>20100202</startdate><enddate>20100202</enddate><creator>Doan, Trung T</creator><scope>EFH</scope></search><sort><creationdate>20100202</creationdate><title>Apparatus for use in semiconductor wafer processing for laterally displacing individual semiconductor devices away from one another</title><author>Doan, Trung T</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_076560123</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2010</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Doan, Trung T</creatorcontrib><creatorcontrib>Micron Technology, Inc</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Doan, Trung T</au><aucorp>Micron Technology, Inc</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus for use in semiconductor wafer processing for laterally displacing individual semiconductor devices away from one another</title><date>2010-02-02</date><risdate>2010</risdate><abstract>A chip-scale or wafer-level-package, having passivation layers on substantially all surfaces thereof to form a hermetically sealed-package, is provided. The package may be formed by disposing a first passivation layer on the passive or backside surface of a semiconductor wafer. The semiconductor wafer may be attached to a flexible membrane and diced, such as by a wafer saw, to separate the semiconductor devices. Once diced, the flexible membrane may be stretched so as to laterally displace the individual semiconductor devices away from one another and substantially expose the side edges thereof. Once the side edges of the semiconductor devices are exposed, a passivation layer may be formed on the side edges and active surfaces of the devices. A portion of the passivation layer over the active surface of each semiconductor device may be removed so as to expose conductive elements formed therebeneath.</abstract><oa>free_for_read</oa></addata></record>
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title Apparatus for use in semiconductor wafer processing for laterally displacing individual semiconductor devices away from one another
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-28T04%3A27%3A49IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Doan,%20Trung%20T&rft.aucorp=Micron%20Technology,%20Inc&rft.date=2010-02-02&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E07656012%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true