Patterning compositions, masks, and methods

Electromagnetic radiation sensitive mask materials are provided. The mask materials are chosen such a first percentage of electromagnetic radiation at a first wavelength is transmitted through the mask material prior to the exposure of the mask material to electromagnetic radiation at a second wavel...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Krak, Stephen J, Elhard, Joel D, Hogue, Eric L, Stanfield, Timothy J, Heggs, Richard P
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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