Industrial microdeposition system including masking to reduce the impact of droplet alignment and droplet volume tolerances and errors

A microdeposition system microdeposit droplets of fluid material to define a feature pattern on a substrate. The feature pattern for the substrate is defined. A mask is created for the feature pattern that reduces a density of defects that occur due to a malfunctioning nozzle of the microdeposition...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Edwards, Charles O, Albertalli, David
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Edwards, Charles O
Albertalli, David
description A microdeposition system microdeposit droplets of fluid material to define a feature pattern on a substrate. The feature pattern for the substrate is defined. A mask is created for the feature pattern that reduces a density of defects that occur due to a malfunctioning nozzle of the microdeposition head. The droplets of fluid material are microdeposited onto the substrate based on the mask to define subfeatures of the feature pattern. One of the nozzles of the microdeposition head is assigned to each of the sub-features in the feature pattern. The nozzles may be assigned randomly or using other functions. The assigned nozzles in the mask are assigned to one of a plurality of passes of the microdeposition head.
format Patent
fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07611754</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07611754</sourcerecordid><originalsourceid>FETCH-uspatents_grants_076117543</originalsourceid><addsrcrecordid>eNqNjEsKAjEMhmfjQtQ75AKCg68DiKJ791LazBhskyFpBS_gua0irl19P_9r3DxPHIplJRchkVcJOIhRJmGwh2VMQOxjCcQ9JGe3N7OAYigeIV8RKA3OZ5AOgsoQMYOL1HNCrorDz71LLKlOJKI69mifFFVFbdqMOhcNZ19OGjjsz7vjvNjgcn2yS19HFYvtpm2369Xyj8oLmw5NqQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Industrial microdeposition system including masking to reduce the impact of droplet alignment and droplet volume tolerances and errors</title><source>USPTO Issued Patents</source><creator>Edwards, Charles O ; Albertalli, David</creator><creatorcontrib>Edwards, Charles O ; Albertalli, David ; ULVAC, Inc</creatorcontrib><description>A microdeposition system microdeposit droplets of fluid material to define a feature pattern on a substrate. The feature pattern for the substrate is defined. A mask is created for the feature pattern that reduces a density of defects that occur due to a malfunctioning nozzle of the microdeposition head. The droplets of fluid material are microdeposited onto the substrate based on the mask to define subfeatures of the feature pattern. One of the nozzles of the microdeposition head is assigned to each of the sub-features in the feature pattern. The nozzles may be assigned randomly or using other functions. The assigned nozzles in the mask are assigned to one of a plurality of passes of the microdeposition head.</description><language>eng</language><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7611754$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,778,800,883,64020</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7611754$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Edwards, Charles O</creatorcontrib><creatorcontrib>Albertalli, David</creatorcontrib><creatorcontrib>ULVAC, Inc</creatorcontrib><title>Industrial microdeposition system including masking to reduce the impact of droplet alignment and droplet volume tolerances and errors</title><description>A microdeposition system microdeposit droplets of fluid material to define a feature pattern on a substrate. The feature pattern for the substrate is defined. A mask is created for the feature pattern that reduces a density of defects that occur due to a malfunctioning nozzle of the microdeposition head. The droplets of fluid material are microdeposited onto the substrate based on the mask to define subfeatures of the feature pattern. One of the nozzles of the microdeposition head is assigned to each of the sub-features in the feature pattern. The nozzles may be assigned randomly or using other functions. The assigned nozzles in the mask are assigned to one of a plurality of passes of the microdeposition head.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNqNjEsKAjEMhmfjQtQ75AKCg68DiKJ791LazBhskyFpBS_gua0irl19P_9r3DxPHIplJRchkVcJOIhRJmGwh2VMQOxjCcQ9JGe3N7OAYigeIV8RKA3OZ5AOgsoQMYOL1HNCrorDz71LLKlOJKI69mifFFVFbdqMOhcNZ19OGjjsz7vjvNjgcn2yS19HFYvtpm2369Xyj8oLmw5NqQ</recordid><startdate>20091103</startdate><enddate>20091103</enddate><creator>Edwards, Charles O</creator><creator>Albertalli, David</creator><scope>EFH</scope></search><sort><creationdate>20091103</creationdate><title>Industrial microdeposition system including masking to reduce the impact of droplet alignment and droplet volume tolerances and errors</title><author>Edwards, Charles O ; Albertalli, David</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_076117543</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Edwards, Charles O</creatorcontrib><creatorcontrib>Albertalli, David</creatorcontrib><creatorcontrib>ULVAC, Inc</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Edwards, Charles O</au><au>Albertalli, David</au><aucorp>ULVAC, Inc</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Industrial microdeposition system including masking to reduce the impact of droplet alignment and droplet volume tolerances and errors</title><date>2009-11-03</date><risdate>2009</risdate><abstract>A microdeposition system microdeposit droplets of fluid material to define a feature pattern on a substrate. The feature pattern for the substrate is defined. A mask is created for the feature pattern that reduces a density of defects that occur due to a malfunctioning nozzle of the microdeposition head. The droplets of fluid material are microdeposited onto the substrate based on the mask to define subfeatures of the feature pattern. One of the nozzles of the microdeposition head is assigned to each of the sub-features in the feature pattern. The nozzles may be assigned randomly or using other functions. The assigned nozzles in the mask are assigned to one of a plurality of passes of the microdeposition head.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_uspatents_grants_07611754
source USPTO Issued Patents
title Industrial microdeposition system including masking to reduce the impact of droplet alignment and droplet volume tolerances and errors
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T12%3A37%3A50IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Edwards,%20Charles%20O&rft.aucorp=ULVAC,%20Inc&rft.date=2009-11-03&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E07611754%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true