High-purity ferromagnetic sputter targets and method of manufacture

High-purity ferromagnetic sputter targets and method of manufacture

The method manufactures high-purity ferromagnetic sputter targets by cryogenic working the sputter target blank at a temperature below at least −50° C. to impart at least about 5 percent strain into the sputter target blank to increase PTF uniformity of the target blank. The sputter target blank is...

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Hauptverfasser: Perry, Andrew C, Koenigsmann, Holger J, Dombrowski, David E, Hunt, Thomas J
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Sprache:eng
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creator Perry, Andrew C
Koenigsmann, Holger J
Dombrowski, David E
Hunt, Thomas J
description The method manufactures high-purity ferromagnetic sputter targets by cryogenic working the sputter target blank at a temperature below at least −50° C. to impart at least about 5 percent strain into the sputter target blank to increase PTF uniformity of the target blank. The sputter target blank is a nonferrous metal selected from the group consisting of cobalt and nickel; and the nonferrous metal has a purity of at least about 99.99 weight percent. Finally, fabricating the sputter target blank forms a sputter target having an improved PTF uniformity arising from the cryogenic working.
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title High-purity ferromagnetic sputter targets and method of manufacture
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