Exposure apparatus and method

A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the semiconductor device through an object lens, developing the resist exposed by the light pattern to form a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Noguchi, Minori, Kenbo, Yukio, Oshida, Yoshitada, Shiba, Masataka, Yoshitaka, Yasuhiro, Murayama, Makoto
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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