Semiconductor device and manufacturing method thereof

Disconnection and deterioration in step coverage of wirings are prevented to offer a semiconductor device having higher reliability. A pad electrode is formed on a surface of a silicon die. A via hole penetrating the silicon die is formed from a back surface of the silicon die to the pad electrode....

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: Takao, Yukihiro
Format: Patent
Sprache:eng
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