Method for forming micropattern

The present invention provides a method for forming a micropattern, enabling to narrow intervals between resist patterns, in which the narrowing extent of intervals between resist patterns can be increased while maintaining the controllability of resist pattern dimensions and the good resist pattern...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Sugeta, Yoshiki, Ueno, Naohisa
Format: Patent
Sprache:eng
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