Method for manufacturing thin film integrated circuit device, noncontact thin film integrated circuit device and method for manufacturing the same, and idtag and coin including the noncontact thin film integrated circuit device

To provide a thin film integrated circuit which is mass produced at low cost, a method for manufacturing a thin film integrated circuit according to the invention includes the steps of: forming a peel-off layer over a substrate; forming a base film over the peel-off layer; forming a plurality of thi...

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Bibliographische Detailangaben
Hauptverfasser: Yamazaki, Shunpei, Komori, Miho, Satou, Yurika, Hosoki, Kazue, Ogita, Kaori
Format: Patent
Sprache:eng
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