Lithographic apparatus and device manufacturing method

A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto the substrate. Because the image is formed from radiation produced from spaced apart patterning arrays,...

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Bibliographische Detailangaben

1. Verfasser:	Van Buel, Henricus Wilhelmus Maria
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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