Lithographic apparatus and device manufacturing method

A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto the substrate. Because the image is formed from radiation produced from spaced apart patterning arrays,...

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1. Verfasser:	Van Buel, Henricus Wilhelmus Maria
Format:	Patent
Sprache:	eng
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creator	Van Buel, Henricus Wilhelmus Maria
description	A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto the substrate. Because the image is formed from radiation produced from spaced apart patterning arrays, the image arrives from different angles and has a higher effective numerical aperture (NA).
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fullrecord	<record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07563562</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07563562</sourcerecordid><originalsourceid>FETCH-uspatents_grants_075635623</originalsourceid><addsrcrecordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AwKbq4hzh66pcUFiSWpeSXF8UAzQZSBuamZsamZkTERSgCnAC72</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic apparatus and device manufacturing method</title><source>USPTO Issued Patents</source><creator>Van Buel, Henricus Wilhelmus Maria</creator><creatorcontrib>Van Buel, Henricus Wilhelmus Maria ; ASML Netherlands B.V</creatorcontrib><description>A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto the substrate. Because the image is formed from radiation produced from spaced apart patterning arrays, the image arrives from different angles and has a higher effective numerical aperture (NA).</description><language>eng</language><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7563562$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,776,798,881,64012</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7563562$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Van Buel, Henricus Wilhelmus Maria</creatorcontrib><creatorcontrib>ASML Netherlands B.V</creatorcontrib><title>Lithographic apparatus and device manufacturing method</title><description>A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto the substrate. Because the image is formed from radiation produced from spaced apart patterning arrays, the image arrives from different angles and has a higher effective numerical aperture (NA).</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AwKbq4hzh66pcUFiSWpeSXF8UAzQZSBuamZsamZkTERSgCnAC72</recordid><startdate>20090721</startdate><enddate>20090721</enddate><creator>Van Buel, Henricus Wilhelmus Maria</creator><scope>EFH</scope></search><sort><creationdate>20090721</creationdate><title>Lithographic apparatus and device manufacturing method</title><author>Van Buel, Henricus Wilhelmus Maria</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_075635623</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Van Buel, Henricus Wilhelmus Maria</creatorcontrib><creatorcontrib>ASML Netherlands B.V</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Van Buel, Henricus Wilhelmus Maria</au><aucorp>ASML Netherlands B.V</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus and device manufacturing method</title><date>2009-07-21</date><risdate>2009</risdate><abstract>A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto the substrate. Because the image is formed from radiation produced from spaced apart patterning arrays, the image arrives from different angles and has a higher effective numerical aperture (NA).</abstract><oa>free_for_read</oa></addata></record>
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title	Lithographic apparatus and device manufacturing method
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