Lithographic apparatus and device manufacturing method

A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an illumination system onto a target portion of the surface of a substrate supported on a substrate support. The ta...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Van Der Feltz, Gustaaf Willem, Gui, Cheng-Qun, Hoefnagels, Johan Christiaan Gerard
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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