Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an illumination system onto a target portion of the surface of a substrate supported on a substrate support. The ta...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Van Der Feltz, Gustaaf Willem, Gui, Cheng-Qun, Hoefnagels, Johan Christiaan Gerard
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Van Der Feltz, Gustaaf Willem
Gui, Cheng-Qun
Hoefnagels, Johan Christiaan Gerard
description A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an illumination system onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.
format Patent
fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07561251</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07561251</sourcerecordid><originalsourceid>FETCH-uspatents_grants_075612513</originalsourceid><addsrcrecordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AwKbq4hzh66pcUFiSWpeSXF8UAzQZSBuamZoZGpoTERSgCl1S7o</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic apparatus and device manufacturing method</title><source>USPTO Issued Patents</source><creator>Van Der Feltz, Gustaaf Willem ; Gui, Cheng-Qun ; Hoefnagels, Johan Christiaan Gerard</creator><creatorcontrib>Van Der Feltz, Gustaaf Willem ; Gui, Cheng-Qun ; Hoefnagels, Johan Christiaan Gerard ; ASML Netherlands B.V</creatorcontrib><description>A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an illumination system onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.</description><language>eng</language><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7561251$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,802,885,64039</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7561251$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Van Der Feltz, Gustaaf Willem</creatorcontrib><creatorcontrib>Gui, Cheng-Qun</creatorcontrib><creatorcontrib>Hoefnagels, Johan Christiaan Gerard</creatorcontrib><creatorcontrib>ASML Netherlands B.V</creatorcontrib><title>Lithographic apparatus and device manufacturing method</title><description>A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an illumination system onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AwKbq4hzh66pcUFiSWpeSXF8UAzQZSBuamZoZGpoTERSgCl1S7o</recordid><startdate>20090714</startdate><enddate>20090714</enddate><creator>Van Der Feltz, Gustaaf Willem</creator><creator>Gui, Cheng-Qun</creator><creator>Hoefnagels, Johan Christiaan Gerard</creator><scope>EFH</scope></search><sort><creationdate>20090714</creationdate><title>Lithographic apparatus and device manufacturing method</title><author>Van Der Feltz, Gustaaf Willem ; Gui, Cheng-Qun ; Hoefnagels, Johan Christiaan Gerard</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_075612513</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Van Der Feltz, Gustaaf Willem</creatorcontrib><creatorcontrib>Gui, Cheng-Qun</creatorcontrib><creatorcontrib>Hoefnagels, Johan Christiaan Gerard</creatorcontrib><creatorcontrib>ASML Netherlands B.V</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Van Der Feltz, Gustaaf Willem</au><au>Gui, Cheng-Qun</au><au>Hoefnagels, Johan Christiaan Gerard</au><aucorp>ASML Netherlands B.V</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus and device manufacturing method</title><date>2009-07-14</date><risdate>2009</risdate><abstract>A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an illumination system onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_uspatents_grants_07561251
source USPTO Issued Patents
title Lithographic apparatus and device manufacturing method
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T23%3A21%3A12IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Van%20Der%20Feltz,%20Gustaaf%20Willem&rft.aucorp=ASML%20Netherlands%20B.V&rft.date=2009-07-14&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E07561251%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true