Lithography process optimization and system

Lithography process optimization and system

The first and second example embodiments are Pattern Fidelity Optimization Procedures for a Multiple Exposure Scheme. In the third example embodiment, the aperatures from the multiple exposure system can be combined into a single aperture by adding the apertures and modulating the relative transmiss...

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Hauptverfasser: Crouse, Michael Matthew, Yudhistira, Yasri
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creator Crouse, Michael Matthew
Yudhistira, Yasri
description The first and second example embodiments are Pattern Fidelity Optimization Procedures for a Multiple Exposure Scheme. In the third example embodiment, the aperatures from the multiple exposure system can be combined into a single aperture by adding the apertures and modulating the relative transmission thru the respective apertures to match the prescribed dose split determined in above in the first embodiment.
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title Lithography process optimization and system
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