Apparatus for forming a porous reaction injection molded chemical mechanical polishing pad

Apparatus for forming a porous reaction injection molded chemical mechanical polishing pad

The present invention provides an apparatus for forming a chemical mechanical polishing pad, comprising a tank with polymeric materials, a storage silo with microspheres, a isocyanate storage tank with isocyanates and a premix prep tank for forming a pre-mixture of the polymeric materials and the mi...

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Hauptverfasser: James, David B, Roberts, John V. H
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creator James, David B
Roberts, John V. H
description The present invention provides an apparatus for forming a chemical mechanical polishing pad, comprising a tank with polymeric materials, a storage silo with microspheres, a isocyanate storage tank with isocyanates and a premix prep tank for forming a pre-mixture of the polymeric materials and the microspheres. The invention further provides a premix run tank for storing the pre-mixture, a mixer for forming a mixture of the pre-mixture and the isocyanates, a closed mold for reaction-injection molding the mixture and a vacuum for degassing at least one of the tank, isocyanate storage tank or the mold.
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fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07537446</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07537446</sourcerecordid><originalsourceid>FETCH-uspatents_grants_075374463</originalsourceid><addsrcrecordid>eNqNjEEKAjEQBHPxIOof5gOCsKt7FlF8gCcvMiSzm0iSGTLZ_2vUB3hoqmiaXpr7UQQL1llh5NKSQp4AQbjwuyyEtgbOEPKTvpY4OnJgPaVgMUIi6zF_VDgG9e1A0K3NYsSotPlxZeByvp2u21kFK-Wqj6lgw27Yd0PfH7o_Ji8MkDxU</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Apparatus for forming a porous reaction injection molded chemical mechanical polishing pad</title><source>USPTO Issued Patents</source><creator>James, David B ; Roberts, John V. H</creator><creatorcontrib>James, David B ; Roberts, John V. H ; Rohm and Haas Electronic Materials CMP Holdings, Inc</creatorcontrib><description>The present invention provides an apparatus for forming a chemical mechanical polishing pad, comprising a tank with polymeric materials, a storage silo with microspheres, a isocyanate storage tank with isocyanates and a premix prep tank for forming a pre-mixture of the polymeric materials and the microspheres. The invention further provides a premix run tank for storing the pre-mixture, a mixer for forming a mixture of the pre-mixture and the isocyanates, a closed mold for reaction-injection molding the mixture and a vacuum for degassing at least one of the tank, isocyanate storage tank or the mold.</description><language>eng</language><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7537446$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,776,798,881,64015</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7537446$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>James, David B</creatorcontrib><creatorcontrib>Roberts, John V. H</creatorcontrib><creatorcontrib>Rohm and Haas Electronic Materials CMP Holdings, Inc</creatorcontrib><title>Apparatus for forming a porous reaction injection molded chemical mechanical polishing pad</title><description>The present invention provides an apparatus for forming a chemical mechanical polishing pad, comprising a tank with polymeric materials, a storage silo with microspheres, a isocyanate storage tank with isocyanates and a premix prep tank for forming a pre-mixture of the polymeric materials and the microspheres. The invention further provides a premix run tank for storing the pre-mixture, a mixer for forming a mixture of the pre-mixture and the isocyanates, a closed mold for reaction-injection molding the mixture and a vacuum for degassing at least one of the tank, isocyanate storage tank or the mold.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNqNjEEKAjEQBHPxIOof5gOCsKt7FlF8gCcvMiSzm0iSGTLZ_2vUB3hoqmiaXpr7UQQL1llh5NKSQp4AQbjwuyyEtgbOEPKTvpY4OnJgPaVgMUIi6zF_VDgG9e1A0K3NYsSotPlxZeByvp2u21kFK-Wqj6lgw27Yd0PfH7o_Ji8MkDxU</recordid><startdate>20090526</startdate><enddate>20090526</enddate><creator>James, David B</creator><creator>Roberts, John V. H</creator><scope>EFH</scope></search><sort><creationdate>20090526</creationdate><title>Apparatus for forming a porous reaction injection molded chemical mechanical polishing pad</title><author>James, David B ; Roberts, John V. H</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_075374463</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><toplevel>online_resources</toplevel><creatorcontrib>James, David B</creatorcontrib><creatorcontrib>Roberts, John V. H</creatorcontrib><creatorcontrib>Rohm and Haas Electronic Materials CMP Holdings, Inc</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>James, David B</au><au>Roberts, John V. H</au><aucorp>Rohm and Haas Electronic Materials CMP Holdings, Inc</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus for forming a porous reaction injection molded chemical mechanical polishing pad</title><date>2009-05-26</date><risdate>2009</risdate><abstract>The present invention provides an apparatus for forming a chemical mechanical polishing pad, comprising a tank with polymeric materials, a storage silo with microspheres, a isocyanate storage tank with isocyanates and a premix prep tank for forming a pre-mixture of the polymeric materials and the microspheres. The invention further provides a premix run tank for storing the pre-mixture, a mixer for forming a mixture of the pre-mixture and the isocyanates, a closed mold for reaction-injection molding the mixture and a vacuum for degassing at least one of the tank, isocyanate storage tank or the mold.</abstract><oa>free_for_read</oa></addata></record>
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title Apparatus for forming a porous reaction injection molded chemical mechanical polishing pad
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-23T22%3A41%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=James,%20David%20B&rft.aucorp=Rohm%20and%20Haas%20Electronic%20Materials%20CMP%20Holdings,%20Inc&rft.date=2009-05-26&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E07537446%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true