Method for evaluating quality of semiconductor substrate and method for manufacturing semiconductor substrate

Methods for evaluating a quality of a semiconductor substrate. In one aspect, etching a surface of the semiconductor substrate by dry-etching, detecting bright points on the surface of the etched surface with a foreign matter inspection device, and evaluating the quality of the semiconductor substra...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: Miyazaki, Morimasa
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!