Copolymers, polymer resin composition for buffer layer method of forming a pattern using the same and method of manufacturing a capacitor using the same

Copolymers, polymer resin composition for buffer layer method of forming a pattern using the same and method of manufacturing a capacitor using the same

12 3 16 The invention is directed to particular polymer compositions that may be generally characterized by the formula: wherein the variables L, M and N represent the relative molar fractions of the monomers and satisfy the expressions 0

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Hauptverfasser: Ahn, Sun-Yul, Kang, Kyong-Rim, Kim, Tae-Sung, Kim, Young-Ho, Lee, Jung-Hoon
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Sprache:eng
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creator Ahn, Sun-Yul
Kang, Kyong-Rim
Kim, Tae-Sung
Kim, Young-Ho
Lee, Jung-Hoon
description 12 3 16 The invention is directed to particular polymer compositions that may be generally characterized by the formula: wherein the variables L, M and N represent the relative molar fractions of the monomers and satisfy the expressions 0
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title Copolymers, polymer resin composition for buffer layer method of forming a pattern using the same and method of manufacturing a capacitor using the same
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