Use of scanning theme implanters and annealers for selective implantation and annealing

A method and system for integrated circuit (IC) processing combines an ion implantation tool and a laser anneal tool in a single unit with a shared precision X-Y scanner. A semiconductor wafer is loaded onto a the X-Y table of the scanner. Data defining the desired ion implantation is used to first...

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Bibliographische Detailangaben

Hauptverfasser:	Kluth, George Jonathan, Bonser, Douglas James
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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