Method and apparatus for thermal development with development medium remover
This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt, contacting...
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creator | McMillen, Robert A Dudek, Dietmar Hackler, Mark A Kannurpatti, Anandkumar R Trainor, Jr, John W |
description | This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt, contacting the heated photosensitive element with a development medium to absorb the liquefied portion at a contact location, and removing the development medium from the photosensitive element with a remover at a location away from the contact location. |
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Du Pont de Nemours & Company</creatorcontrib><description>This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt, contacting the heated photosensitive element with a development medium to absorb the liquefied portion at a contact location, and removing the development medium from the photosensitive element with a remover at a location away from the contact location.</description><language>eng</language><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7503258$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,776,798,881,64012</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7503258$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>McMillen, Robert A</creatorcontrib><creatorcontrib>Dudek, Dietmar</creatorcontrib><creatorcontrib>Hackler, Mark A</creatorcontrib><creatorcontrib>Kannurpatti, Anandkumar R</creatorcontrib><creatorcontrib>Trainor, Jr, John W</creatorcontrib><creatorcontrib>E. I. Du Pont de Nemours & Company</creatorcontrib><title>Method and apparatus for thermal development with development medium remover</title><description>This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt, contacting the heated photosensitive element with a development medium to absorb the liquefied portion at a contact location, and removing the development medium from the photosensitive element with a remover at a location away from the contact location.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZPDxTS3JyE9RSMwD4oKCxKLEktJihbT8IoWSjNSi3MQchZTUstSc_ILc1LwShfLMkgwUgdzUlMzSXIWi1Nz8stQiHgbWtMSc4lReKM3NoODmGuLsoVtaXJBYAlRfHJ9elAiiDMxNDYyNTC2MiVACAJ4bN1k</recordid><startdate>20090317</startdate><enddate>20090317</enddate><creator>McMillen, Robert A</creator><creator>Dudek, Dietmar</creator><creator>Hackler, Mark A</creator><creator>Kannurpatti, Anandkumar R</creator><creator>Trainor, Jr, John W</creator><scope>EFH</scope></search><sort><creationdate>20090317</creationdate><title>Method and apparatus for thermal development with development medium remover</title><author>McMillen, Robert A ; Dudek, Dietmar ; Hackler, Mark A ; Kannurpatti, Anandkumar R ; Trainor, Jr, John W</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_075032583</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><toplevel>online_resources</toplevel><creatorcontrib>McMillen, Robert A</creatorcontrib><creatorcontrib>Dudek, Dietmar</creatorcontrib><creatorcontrib>Hackler, Mark A</creatorcontrib><creatorcontrib>Kannurpatti, Anandkumar R</creatorcontrib><creatorcontrib>Trainor, Jr, John W</creatorcontrib><creatorcontrib>E. I. Du Pont de Nemours & Company</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>McMillen, Robert A</au><au>Dudek, Dietmar</au><au>Hackler, Mark A</au><au>Kannurpatti, Anandkumar R</au><au>Trainor, Jr, John W</au><aucorp>E. I. Du Pont de Nemours & Company</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and apparatus for thermal development with development medium remover</title><date>2009-03-17</date><risdate>2009</risdate><abstract>This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt, contacting the heated photosensitive element with a development medium to absorb the liquefied portion at a contact location, and removing the development medium from the photosensitive element with a remover at a location away from the contact location.</abstract><oa>free_for_read</oa></addata></record> |
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title | Method and apparatus for thermal development with development medium remover |
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