Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory
A method of manufacturing a magnetoresistance effect element includes forming an insulating layer on a first ferromagnetic layer, forming an aperture reaching the first ferromagnetic layer by thrusting a needle from the top surface of the insulating layer, and depositing a ferromagnetic material to...
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creator | Okuno, Shiho Ohsawa, Yuichi Haneda, Shigeru Kamiguchi, Yuzo Kishi, Tatsuya |
description | A method of manufacturing a magnetoresistance effect element includes forming an insulating layer on a first ferromagnetic layer, forming an aperture reaching the first ferromagnetic layer by thrusting a needle from the top surface of the insulating layer, and depositing a ferromagnetic material to form a second ferromagnetic layer overlying the insulating layer which buries the aperture. The aperture can have an opening width not larger than 20 nm. A current flowing between the first ferromagnetic layer and the needle can be monitored, and thrusting of the needle an be interrupted when the current reaches a predetermined value. |
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fullrecord | <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07494724</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07494724</sourcerecordid><originalsourceid>FETCH-uspatents_grants_074947243</originalsourceid><addsrcrecordid>eNqNizEKAjEQRdNYiHqHOcAKooHFWhQbO3sZkkkMJJMlmRTe3g0s2Fo9-P-9tYoP9EySC9VQBdkQkHNkBChSIpYBglRIyM2hkVYCe0gk72yHee1tMFBoKtk208-lA2T7ExKlXD5btXIYK-0WbhTcrs_Lfd_qhDJH9eULdhxGfdbjUZ_-UL5Aj0OD</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory</title><source>USPTO Issued Patents</source><creator>Okuno, Shiho ; Ohsawa, Yuichi ; Haneda, Shigeru ; Kamiguchi, Yuzo ; Kishi, Tatsuya</creator><creatorcontrib>Okuno, Shiho ; Ohsawa, Yuichi ; Haneda, Shigeru ; Kamiguchi, Yuzo ; Kishi, Tatsuya ; Kabushiki Kaisha Toshiba</creatorcontrib><description>A method of manufacturing a magnetoresistance effect element includes forming an insulating layer on a first ferromagnetic layer, forming an aperture reaching the first ferromagnetic layer by thrusting a needle from the top surface of the insulating layer, and depositing a ferromagnetic material to form a second ferromagnetic layer overlying the insulating layer which buries the aperture. The aperture can have an opening width not larger than 20 nm. A current flowing between the first ferromagnetic layer and the needle can be monitored, and thrusting of the needle an be interrupted when the current reaches a predetermined value.</description><language>eng</language><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7494724$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,776,798,881,64015</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7494724$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Okuno, Shiho</creatorcontrib><creatorcontrib>Ohsawa, Yuichi</creatorcontrib><creatorcontrib>Haneda, Shigeru</creatorcontrib><creatorcontrib>Kamiguchi, Yuzo</creatorcontrib><creatorcontrib>Kishi, Tatsuya</creatorcontrib><creatorcontrib>Kabushiki Kaisha Toshiba</creatorcontrib><title>Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory</title><description>A method of manufacturing a magnetoresistance effect element includes forming an insulating layer on a first ferromagnetic layer, forming an aperture reaching the first ferromagnetic layer by thrusting a needle from the top surface of the insulating layer, and depositing a ferromagnetic material to form a second ferromagnetic layer overlying the insulating layer which buries the aperture. The aperture can have an opening width not larger than 20 nm. A current flowing between the first ferromagnetic layer and the needle can be monitored, and thrusting of the needle an be interrupted when the current reaches a predetermined value.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNqNizEKAjEQRdNYiHqHOcAKooHFWhQbO3sZkkkMJJMlmRTe3g0s2Fo9-P-9tYoP9EySC9VQBdkQkHNkBChSIpYBglRIyM2hkVYCe0gk72yHee1tMFBoKtk208-lA2T7ExKlXD5btXIYK-0WbhTcrs_Lfd_qhDJH9eULdhxGfdbjUZ_-UL5Aj0OD</recordid><startdate>20090224</startdate><enddate>20090224</enddate><creator>Okuno, Shiho</creator><creator>Ohsawa, Yuichi</creator><creator>Haneda, Shigeru</creator><creator>Kamiguchi, Yuzo</creator><creator>Kishi, Tatsuya</creator><scope>EFH</scope></search><sort><creationdate>20090224</creationdate><title>Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory</title><author>Okuno, Shiho ; Ohsawa, Yuichi ; Haneda, Shigeru ; Kamiguchi, Yuzo ; Kishi, Tatsuya</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_074947243</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Okuno, Shiho</creatorcontrib><creatorcontrib>Ohsawa, Yuichi</creatorcontrib><creatorcontrib>Haneda, Shigeru</creatorcontrib><creatorcontrib>Kamiguchi, Yuzo</creatorcontrib><creatorcontrib>Kishi, Tatsuya</creatorcontrib><creatorcontrib>Kabushiki Kaisha Toshiba</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Okuno, Shiho</au><au>Ohsawa, Yuichi</au><au>Haneda, Shigeru</au><au>Kamiguchi, Yuzo</au><au>Kishi, Tatsuya</au><aucorp>Kabushiki Kaisha Toshiba</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory</title><date>2009-02-24</date><risdate>2009</risdate><abstract>A method of manufacturing a magnetoresistance effect element includes forming an insulating layer on a first ferromagnetic layer, forming an aperture reaching the first ferromagnetic layer by thrusting a needle from the top surface of the insulating layer, and depositing a ferromagnetic material to form a second ferromagnetic layer overlying the insulating layer which buries the aperture. The aperture can have an opening width not larger than 20 nm. A current flowing between the first ferromagnetic layer and the needle can be monitored, and thrusting of the needle an be interrupted when the current reaches a predetermined value.</abstract><oa>free_for_read</oa></addata></record> |
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title | Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory |
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