Line photo masks and methods of forming semiconductor devices using the same

According to various embodiments of the invention, there are provided line photo masks having a plurality of line patterns. These masks, which are suitable for preventing electric shorts between the data line images, are disposed on the semiconductor substrate by transferring them, which have the pl...

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1. Verfasser:	Kim, Si-Youn
Format:	Patent
Sprache:	eng
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creator	Kim, Si-Youn
description	According to various embodiments of the invention, there are provided line photo masks having a plurality of line patterns. These masks, which are suitable for preventing electric shorts between the data line images, are disposed on the semiconductor substrate by transferring them, which have the plurality of line patterns, onto a photoresist layer. One of the line patterns has at least one trench pattern.
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title	Line photo masks and methods of forming semiconductor devices using the same
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