Bis(3-amino-4-hydroxyphenyl)adamantane derivatives and process for production thereof

1 4 2 The invention provides compounds which are excellent in terms of heat resistance, mechanical characteristics, electric characteristics, physical properties, etc. and which provide a novel material useful for, for example, interlayer insulating film or protective film for use in semiconductor d...

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Hauptverfasser: Tanaka, Shinji, Ono, Hidetoshi, Kodoi, Kouichi, Hatakeyama, Naoyoshi
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creator Tanaka, Shinji
Ono, Hidetoshi
Kodoi, Kouichi
Hatakeyama, Naoyoshi
description 1 4 2 The invention provides compounds which are excellent in terms of heat resistance, mechanical characteristics, electric characteristics, physical properties, etc. and which provide a novel material useful for, for example, interlayer insulating film or protective film for use in semiconductor devices, interlayer insulating film for use in multilayer wiring boards, cover coating in flexible printed circuits, or a liquid crystal alignment layer.The compounds are bis(3-amino-4-hydroxyphenyl)adamantane derivatives having a structure represented by formula (I) or (II): (each of Rto Rrepresents a halogen atom, a hydroxyl group, an alkyl group, an alkoxyl group, a carboxyl group, or an alkoxycarbonyl group, each of m and a is an integer of 0 to 3, and each of n and b is an integer of 0 to 14, with the proviso that the case where the following three conditions in formula (I) are met is excluded: Ris methyl and present at a bridgehead; m is 0; and n is 2).
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title Bis(3-amino-4-hydroxyphenyl)adamantane derivatives and process for production thereof
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