Deposition chamber and method for depositing low dielectric constant films

4 a4An improved deposition chamber includes a housing defining a chamber which houses a substrate support. A mixture of oxygen and SiFis delivered through a set of first nozzles and silane is delivered through a set of second nozzles into the chamber around the periphery of the substrate support. Si...

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Bibliographische Detailangaben

Hauptverfasser:	Li, Shijian, Wang, Yaxin, Redeker, Fred C, Ishikawa, Tetsuya, Collins, Alan W
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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