Illumination system particularly for microlithography

An illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength especially ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system...

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Bibliographische Detailangaben

Hauptverfasser:	Hainz, Joachim, Singer, Wolfgang, Schubert, Erich
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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