Monitoring system for high-voltage switches
A method and an apparatus are disclosed for measuring contact erosion in an electrical switching device by a dynamic resistance measurement (DRM). To determine an overlap time and a contact erosion in an exemplary switching device, a change in current across the switching device can be measured indi...
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| creator | Hagel, Marek Fehlmann, Patrick |
| description | A method and an apparatus are disclosed for measuring contact erosion in an electrical switching device by a dynamic resistance measurement (DRM). To determine an overlap time and a contact erosion in an exemplary switching device, a change in current across the switching device can be measured indirectly by a measurement current being passed across the switching device and a parallel conductor, the change in current in the parallel conductor being measured. Exemplary embodiments relate, to the following: detection of a differential current measurement signal in the parallel conductor with the aid of a Rogowski coil; and selection of a parallel conductor resistance on an order of the switch resistance. |
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To determine an overlap time and a contact erosion in an exemplary switching device, a change in current across the switching device can be measured indirectly by a measurement current being passed across the switching device and a parallel conductor, the change in current in the parallel conductor being measured. Exemplary embodiments relate, to the following: detection of a differential current measurement signal in the parallel conductor with the aid of a Rogowski coil; and selection of a parallel conductor resistance on an order of the switch resistance.</description><language>eng</language><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7405569$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,802,885,64039</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7405569$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Hagel, Marek</creatorcontrib><creatorcontrib>Fehlmann, Patrick</creatorcontrib><creatorcontrib>ABB Technology AG</creatorcontrib><title>Monitoring system for high-voltage switches</title><description>A method and an apparatus are disclosed for measuring contact erosion in an electrical switching device by a dynamic resistance measurement (DRM). To determine an overlap time and a contact erosion in an exemplary switching device, a change in current across the switching device can be measured indirectly by a measurement current being passed across the switching device and a parallel conductor, the change in current in the parallel conductor being measured. Exemplary embodiments relate, to the following: detection of a differential current measurement signal in the parallel conductor with the aid of a Rogowski coil; and selection of a parallel conductor resistance on an order of the switch resistance.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZND2zc_LLMkvysxLVyiuLC5JzVVIyy9SyMhMz9Aty88pSUxPVSguzyxJzkgt5mFgTUvMKU7lhdLcDApuriHOHrqlxQWJJal5JcXx6UWJIMrA3MTA1NTM0pgIJQBqlyrD</recordid><startdate>20080729</startdate><enddate>20080729</enddate><creator>Hagel, Marek</creator><creator>Fehlmann, Patrick</creator><scope>EFH</scope></search><sort><creationdate>20080729</creationdate><title>Monitoring system for high-voltage switches</title><author>Hagel, Marek ; Fehlmann, Patrick</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_074055693</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Hagel, Marek</creatorcontrib><creatorcontrib>Fehlmann, Patrick</creatorcontrib><creatorcontrib>ABB Technology AG</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Hagel, Marek</au><au>Fehlmann, Patrick</au><aucorp>ABB Technology AG</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Monitoring system for high-voltage switches</title><date>2008-07-29</date><risdate>2008</risdate><abstract>A method and an apparatus are disclosed for measuring contact erosion in an electrical switching device by a dynamic resistance measurement (DRM). To determine an overlap time and a contact erosion in an exemplary switching device, a change in current across the switching device can be measured indirectly by a measurement current being passed across the switching device and a parallel conductor, the change in current in the parallel conductor being measured. Exemplary embodiments relate, to the following: detection of a differential current measurement signal in the parallel conductor with the aid of a Rogowski coil; and selection of a parallel conductor resistance on an order of the switch resistance.</abstract><oa>free_for_read</oa></addata></record> |
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| title | Monitoring system for high-voltage switches |
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