Method for forming a porous reaction injection molded chemical mechanical polishing pad

The present invention provides a method of forming a chemical mechanical polishing pad comprising, providing a tank with polymeric materials, providing a storage silo with microspheres and providing an isocyanate storage tank with isocyanates. The invention further provides delivering the polymeric...

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Bibliographische Detailangaben

Hauptverfasser:	James, David B, Roberts, John V. H
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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