Sequential gas flow oxide deposition technique

A method of depositing a silica glass insulating film over a substrate. In one embodiment the method comprises exposing the substrate to a silicon-containing reactant introduced into a chamber in which the substrate is disposed such that one or more layers of the silicon-containing reactant are adso...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Moghadam, Farhad K, Cox, Michael S, Krishnaraj, Padmanabhan, Pham, Thanh N
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
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