Measurement substrate, substrate table, lithographic apparatus, method of calculating an angle of an alignment beam of an alignment system, and alignment verification method

A method of calculating an angle of an alignment beam of an alignment system in, for example, a lithographic projection apparatus includes measuring the position of at least two alignment marks. These two alignment marks are manufactured on a measurement substrate or they can be arranged on a refere...

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Bibliographische Detailangaben

Hauptverfasser:	Smeets, Erik Marie Jose, Bijnen, Fransiscus Godefridus Casper, Phillipps, Geoffrey Norman
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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