Methods for increasing photo alignment margins

Methods and structures are provided for increasing alignment margins when contacting pitch multiplied interconnect lines with other conductive features in memory devices. The portions of the lines at the periphery of the memory device are formed at an angle and are widened relative to the portions o...

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Bibliographische Detailangaben

Hauptverfasser:	Tran, Luan, Stanton, Bill
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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