In-situ plasma cleaning device for cylindrical surfaces

An in-situ plasma cleaning device (PCD) performs an atomic surface cleaning process to remove contaminants and/or to modify the cylindrical surfaces of both the target and substrate. The atomic cleaning process utilizes a plasma generated locally within the in-situ plasma cleaning device with suitab...

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Bibliographische Detailangaben

Hauptverfasser:	Audino, Michael J, Cipollo, Michael, Glocker, David, Miner, Kevin, Vottis, Patrick
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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