In-situ plasma cleaning device for cylindrical surfaces

In-situ plasma cleaning device for cylindrical surfaces

An in-situ plasma cleaning device (PCD) performs an atomic surface cleaning process to remove contaminants and/or to modify the cylindrical surfaces of both the target and substrate. The atomic cleaning process utilizes a plasma generated locally within the in-situ plasma cleaning device with suitab...

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Hauptverfasser: Audino, Michael J, Cipollo, Michael, Glocker, David, Miner, Kevin, Vottis, Patrick
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Sprache:eng
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creator Audino, Michael J
Cipollo, Michael
Glocker, David
Miner, Kevin
Vottis, Patrick
description An in-situ plasma cleaning device (PCD) performs an atomic surface cleaning process to remove contaminants and/or to modify the cylindrical surfaces of both the target and substrate. The atomic cleaning process utilizes a plasma generated locally within the in-situ plasma cleaning device with suitable properties to clean both the target and substrate cylindrical surfaces either concurrently or separately. Moreover, the in-situ plasma cleaning device is designed to traverse the length of the target and the substrate cylindrical surfaces during the cleaning process.
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title In-situ plasma cleaning device for cylindrical surfaces
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