Use of sacrificial layers in the manufacture of high performance systems on tailored substrates

The invention relates to methods for preparing a removable system on a mother substrate. The method deposits a high surface to volume sacrificial layer on a mother substrate and stabilizes the sacrificial layer by a) removing volatile chemical species in and on the sacrificial layer and/or b) modify...

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Hauptverfasser: Fonash, Stephen J, Li, Handong, Lee, Youngchul, Cuiffi, Joseph D, Hayes, Daniel J
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Sprache:eng
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creator Fonash, Stephen J
Li, Handong
Lee, Youngchul
Cuiffi, Joseph D
Hayes, Daniel J
description The invention relates to methods for preparing a removable system on a mother substrate. The method deposits a high surface to volume sacrificial layer on a mother substrate and stabilizes the sacrificial layer by a) removing volatile chemical species in and on the sacrificial layer and/or b) modifying the surface of the layer. The method coats over the sacrificial layer with a capping medium. A system is the fabricated on the capping medium. The method provides through holes to access the sacrificial layer. The method may also apply a top layer onto the system to form a covered system. The invention also includes the step of removing the sacrificial layer to release the system from the mother substrate. Methods of the invention also include selectively removing a portion of the system and capping layers to form void regions defining an array of islands composed of device, structure, or system and capping layer regions, and optionally filling the island-defining void region with a sacrificial material. In such methods the sacrificial material and the high surface to volume sacrificial layer are removed to release the system from the mother substrate. Methods of the invention also include applying a layer to the capping material side of the released system to form a configuration wherein the system is substantially within a bending-stress reduced neutral plane. The systems fabricated according to the invention may be placed on a wide variety of suitable substrates, including flexible substrates.
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fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07309620</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07309620</sourcerecordid><originalsourceid>FETCH-uspatents_grants_073096203</originalsourceid><addsrcrecordid>eNqNyjEKAjEQQNE0FqLeYS4gBBcUa1nxAFovY5xsAtlkmZkUe3ujeACrX_y3NsNDCIoHQcfRRxcxQcKFWCBm0EAwYa4enVb-whDHADOxL9yOI5BFlCaB0jjGVJheIPUpyqgkW7PymIR2v24MXPv75bavMrefVYaR8RN76uz5eLDdH-QNQYw-KQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Use of sacrificial layers in the manufacture of high performance systems on tailored substrates</title><source>USPTO Issued Patents</source><creator>Fonash, Stephen J ; Li, Handong ; Lee, Youngchul ; Cuiffi, Joseph D ; Hayes, Daniel J</creator><creatorcontrib>Fonash, Stephen J ; Li, Handong ; Lee, Youngchul ; Cuiffi, Joseph D ; Hayes, Daniel J ; The Penn State Research Foundation</creatorcontrib><description>The invention relates to methods for preparing a removable system on a mother substrate. The method deposits a high surface to volume sacrificial layer on a mother substrate and stabilizes the sacrificial layer by a) removing volatile chemical species in and on the sacrificial layer and/or b) modifying the surface of the layer. The method coats over the sacrificial layer with a capping medium. A system is the fabricated on the capping medium. The method provides through holes to access the sacrificial layer. The method may also apply a top layer onto the system to form a covered system. The invention also includes the step of removing the sacrificial layer to release the system from the mother substrate. Methods of the invention also include selectively removing a portion of the system and capping layers to form void regions defining an array of islands composed of device, structure, or system and capping layer regions, and optionally filling the island-defining void region with a sacrificial material. In such methods the sacrificial material and the high surface to volume sacrificial layer are removed to release the system from the mother substrate. Methods of the invention also include applying a layer to the capping material side of the released system to form a configuration wherein the system is substantially within a bending-stress reduced neutral plane. The systems fabricated according to the invention may be placed on a wide variety of suitable substrates, including flexible substrates.</description><language>eng</language><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7309620$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,776,798,881,64012</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7309620$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Fonash, Stephen J</creatorcontrib><creatorcontrib>Li, Handong</creatorcontrib><creatorcontrib>Lee, Youngchul</creatorcontrib><creatorcontrib>Cuiffi, Joseph D</creatorcontrib><creatorcontrib>Hayes, Daniel J</creatorcontrib><creatorcontrib>The Penn State Research Foundation</creatorcontrib><title>Use of sacrificial layers in the manufacture of high performance systems on tailored substrates</title><description>The invention relates to methods for preparing a removable system on a mother substrate. The method deposits a high surface to volume sacrificial layer on a mother substrate and stabilizes the sacrificial layer by a) removing volatile chemical species in and on the sacrificial layer and/or b) modifying the surface of the layer. The method coats over the sacrificial layer with a capping medium. A system is the fabricated on the capping medium. The method provides through holes to access the sacrificial layer. The method may also apply a top layer onto the system to form a covered system. The invention also includes the step of removing the sacrificial layer to release the system from the mother substrate. Methods of the invention also include selectively removing a portion of the system and capping layers to form void regions defining an array of islands composed of device, structure, or system and capping layer regions, and optionally filling the island-defining void region with a sacrificial material. In such methods the sacrificial material and the high surface to volume sacrificial layer are removed to release the system from the mother substrate. Methods of the invention also include applying a layer to the capping material side of the released system to form a configuration wherein the system is substantially within a bending-stress reduced neutral plane. The systems fabricated according to the invention may be placed on a wide variety of suitable substrates, including flexible substrates.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNqNyjEKAjEQQNE0FqLeYS4gBBcUa1nxAFovY5xsAtlkmZkUe3ujeACrX_y3NsNDCIoHQcfRRxcxQcKFWCBm0EAwYa4enVb-whDHADOxL9yOI5BFlCaB0jjGVJheIPUpyqgkW7PymIR2v24MXPv75bavMrefVYaR8RN76uz5eLDdH-QNQYw-KQ</recordid><startdate>20071218</startdate><enddate>20071218</enddate><creator>Fonash, Stephen J</creator><creator>Li, Handong</creator><creator>Lee, Youngchul</creator><creator>Cuiffi, Joseph D</creator><creator>Hayes, Daniel J</creator><scope>EFH</scope></search><sort><creationdate>20071218</creationdate><title>Use of sacrificial layers in the manufacture of high performance systems on tailored substrates</title><author>Fonash, Stephen J ; Li, Handong ; Lee, Youngchul ; Cuiffi, Joseph D ; Hayes, Daniel J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_073096203</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Fonash, Stephen J</creatorcontrib><creatorcontrib>Li, Handong</creatorcontrib><creatorcontrib>Lee, Youngchul</creatorcontrib><creatorcontrib>Cuiffi, Joseph D</creatorcontrib><creatorcontrib>Hayes, Daniel J</creatorcontrib><creatorcontrib>The Penn State Research Foundation</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Fonash, Stephen J</au><au>Li, Handong</au><au>Lee, Youngchul</au><au>Cuiffi, Joseph D</au><au>Hayes, Daniel J</au><aucorp>The Penn State Research Foundation</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Use of sacrificial layers in the manufacture of high performance systems on tailored substrates</title><date>2007-12-18</date><risdate>2007</risdate><abstract>The invention relates to methods for preparing a removable system on a mother substrate. The method deposits a high surface to volume sacrificial layer on a mother substrate and stabilizes the sacrificial layer by a) removing volatile chemical species in and on the sacrificial layer and/or b) modifying the surface of the layer. The method coats over the sacrificial layer with a capping medium. A system is the fabricated on the capping medium. The method provides through holes to access the sacrificial layer. The method may also apply a top layer onto the system to form a covered system. The invention also includes the step of removing the sacrificial layer to release the system from the mother substrate. Methods of the invention also include selectively removing a portion of the system and capping layers to form void regions defining an array of islands composed of device, structure, or system and capping layer regions, and optionally filling the island-defining void region with a sacrificial material. In such methods the sacrificial material and the high surface to volume sacrificial layer are removed to release the system from the mother substrate. Methods of the invention also include applying a layer to the capping material side of the released system to form a configuration wherein the system is substantially within a bending-stress reduced neutral plane. The systems fabricated according to the invention may be placed on a wide variety of suitable substrates, including flexible substrates.</abstract><oa>free_for_read</oa></addata></record>
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title Use of sacrificial layers in the manufacture of high performance systems on tailored substrates
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-04T05%3A19%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Fonash,%20Stephen%20J&rft.aucorp=The%20Penn%20State%20Research%20Foundation&rft.date=2007-12-18&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E07309620%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true