Photoresist trimming process
2 2 22 2A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The tri...
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| creator | Crawford, Shaun Huynh, Cuc K Reid, A. Gary Smith, Adam C Wagner, Thomas M |
| description | 2 2 22 2A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes Oand at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist The other oxide gases, in addition to the Omay include CO, SOand NO. |
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Gary ; Smith, Adam C ; Wagner, Thomas M</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_073040003</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Crawford, Shaun</creatorcontrib><creatorcontrib>Huynh, Cuc K</creatorcontrib><creatorcontrib>Reid, A. Gary</creatorcontrib><creatorcontrib>Smith, Adam C</creatorcontrib><creatorcontrib>Wagner, Thomas M</creatorcontrib><creatorcontrib>International Business Machines Corporation</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Crawford, Shaun</au><au>Huynh, Cuc K</au><au>Reid, A. 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| title | Photoresist trimming process |
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