Semiconductor device and a method of manufacturing the same

An insulating portion of the respective wiring layers for a semiconductor device is constituted of insulating films. The one insulating film is made of a material whose conductivity is higher than that of the other insulating film that is made of an ordinary silicon oxide film and is provided in con...

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Bibliographische Detailangaben

Hauptverfasser:	Uchikoshi, Ken, Suwanai, Naokatsu, Tachigami, Atsushi, Hotta, Katsuhiko, Sahara, Masashi, Sato, Kazuhiko
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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