Compositions for preparing low dielectric materials

Compositions for preparing low dielectric materials

Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectri...

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Hauptverfasser: Peterson, Brian Keith, Kirner, John Francis, Weigel, Scott Jeffrey, MacDougall, James Edward, Braymer, Thomas Albert, Campbell, Keith Douglas, Devenney, Martin, Ramberg, C. Eric, Chondroudis, Konstantinos, Cendak, Keith
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creator Peterson, Brian Keith
Kirner, John Francis
Weigel, Scott Jeffrey
MacDougall, James Edward
Braymer, Thomas Albert
Campbell, Keith Douglas
Devenney, Martin
Ramberg, C. Eric
Chondroudis, Konstantinos
Cendak, Keith
description Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.
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title Compositions for preparing low dielectric materials
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