Bakeable multi-layer imageable element
2163221 32 643232nThermally imageable multilayer imageable elements useful as lithographic printing plate precursors that have good solvent resistance are disclosed. The underlayer of the imageable element comprises an acidic copolymer that comprises, in polymerized form, about 10 mol % to about 75...
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| creator | Ray, Kevin B Kitson, Anthony P |
| description | 2163221 32 643232nThermally imageable multilayer imageable elements useful as lithographic printing plate precursors that have good solvent resistance are disclosed. The underlayer of the imageable element comprises an acidic copolymer that comprises, in polymerized form, about 10 mol % to about 75 mol % of one or more monomers of the formula: CH═CH(R)-Z-X-NH-CO-NH-CH-(R)(COH); in which: Ris H or CH; Ris H or OH; Z is -CH- or -C(O) -Y-; Y is -O- or -NH-; and X is selected from -C(CH)-, -CH(CH)- and -(CH)-, in which n is an integer from 1 to 12. |
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| fullrecord | <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07291440</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07291440</sourcerecordid><originalsourceid>FETCH-uspatents_grants_072914403</originalsourceid><addsrcrecordid>eNrjZFBzSsxOTUzKSVXILc0pydTNSaxMLVLIzE1Mh4im5qTmpuaV8DCwpiXmFKfyQmluBgU31xBnD93S4oLEEqCC4vj0okQQZWBuZGloYmJgTIQSAD5BKE4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Bakeable multi-layer imageable element</title><source>USPTO Issued Patents</source><creator>Ray, Kevin B ; Kitson, Anthony P</creator><creatorcontrib>Ray, Kevin B ; Kitson, Anthony P ; Eastman Kodak Company</creatorcontrib><description>2163221 32 643232nThermally imageable multilayer imageable elements useful as lithographic printing plate precursors that have good solvent resistance are disclosed. The underlayer of the imageable element comprises an acidic copolymer that comprises, in polymerized form, about 10 mol % to about 75 mol % of one or more monomers of the formula: CH═CH(R)-Z-X-NH-CO-NH-CH-(R)(COH); in which: Ris H or CH; Ris H or OH; Z is -CH- or -C(O) -Y-; Y is -O- or -NH-; and X is selected from -C(CH)-, -CH(CH)- and -(CH)-, in which n is an integer from 1 to 12.</description><language>eng</language><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7291440$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,776,798,881,64012</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7291440$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Ray, Kevin B</creatorcontrib><creatorcontrib>Kitson, Anthony P</creatorcontrib><creatorcontrib>Eastman Kodak Company</creatorcontrib><title>Bakeable multi-layer imageable element</title><description>2163221 32 643232nThermally imageable multilayer imageable elements useful as lithographic printing plate precursors that have good solvent resistance are disclosed. The underlayer of the imageable element comprises an acidic copolymer that comprises, in polymerized form, about 10 mol % to about 75 mol % of one or more monomers of the formula: CH═CH(R)-Z-X-NH-CO-NH-CH-(R)(COH); in which: Ris H or CH; Ris H or OH; Z is -CH- or -C(O) -Y-; Y is -O- or -NH-; and X is selected from -C(CH)-, -CH(CH)- and -(CH)-, in which n is an integer from 1 to 12.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZFBzSsxOTUzKSVXILc0pydTNSaxMLVLIzE1Mh4im5qTmpuaV8DCwpiXmFKfyQmluBgU31xBnD93S4oLEEqCC4vj0okQQZWBuZGloYmJgTIQSAD5BKE4</recordid><startdate>20071106</startdate><enddate>20071106</enddate><creator>Ray, Kevin B</creator><creator>Kitson, Anthony P</creator><scope>EFH</scope></search><sort><creationdate>20071106</creationdate><title>Bakeable multi-layer imageable element</title><author>Ray, Kevin B ; Kitson, Anthony P</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_072914403</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Ray, Kevin B</creatorcontrib><creatorcontrib>Kitson, Anthony P</creatorcontrib><creatorcontrib>Eastman Kodak Company</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Ray, Kevin B</au><au>Kitson, Anthony P</au><aucorp>Eastman Kodak Company</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Bakeable multi-layer imageable element</title><date>2007-11-06</date><risdate>2007</risdate><abstract>2163221 32 643232nThermally imageable multilayer imageable elements useful as lithographic printing plate precursors that have good solvent resistance are disclosed. The underlayer of the imageable element comprises an acidic copolymer that comprises, in polymerized form, about 10 mol % to about 75 mol % of one or more monomers of the formula: CH═CH(R)-Z-X-NH-CO-NH-CH-(R)(COH); in which: Ris H or CH; Ris H or OH; Z is -CH- or -C(O) -Y-; Y is -O- or -NH-; and X is selected from -C(CH)-, -CH(CH)- and -(CH)-, in which n is an integer from 1 to 12.</abstract><oa>free_for_read</oa></addata></record> |
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| title | Bakeable multi-layer imageable element |
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