Chemical-mechanical polishing of metals in an oxidized form

The invention provides a method for polishing a substrate comprising a metal in an oxidized form, the method comprising the steps of: (a) providing a substrate comprising a metal in an oxidized form, (b) contacting a portion of the substrate with a chemical-mechanical polishing system comprising: (i...

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Bibliographische Detailangaben

Hauptverfasser:	De Rege Thesauro, Francesco, Brusic, Vlasta, Bayer, Benjamin P
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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