System and method of measurement, system and method of alignment, lithographic apparatus and method

A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted...

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Bibliographische Detailangaben

Hauptverfasser:	Nijmeijer, Gerrit Johannes, Bruinsma, Anastasius Jacobus Anicetus, Hoogendam, Christiaan Alexander, Broekhuijse, Jeroen Thomas, Dressler, Sigurd, Krijnen, Edwin Eduard Nicolaas Josephus, Van Leeuwen, Robbert Edgar, Vanneer, Roeland Nicolaas Maria, Ottens, Cornelis Christiaan
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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