Method and apparatus for low temperature copper to copper bonding

A method comprising: coating a conductive bump on a first substrate with a conductive material to form a coated conductive bump; coating a conductive bump on a second substrate with a conductive material to form a coated conductive bump; and bonding the coated conductive bump on the first substrate...

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Hauptverfasser: Ramanathan, Shriram, Kim, Sarah E
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Sprache:eng
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creator Ramanathan, Shriram
Kim, Sarah E
description A method comprising: coating a conductive bump on a first substrate with a conductive material to form a coated conductive bump; coating a conductive bump on a second substrate with a conductive material to form a coated conductive bump; and bonding the coated conductive bump on the first substrate to the coated conductive bump on the second substrate to electrically connect the first substrate to the second substrate.
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title Method and apparatus for low temperature copper to copper bonding
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