Device and method for manipulation and routing of a metrology beam

A lithographic projection apparatus is equipped with a device for manipulation and routing of at least one portion of a metrology beam of radiation. The device includes a first and a second optical wedge, wherein the second optical wedge and the first optical wedge having a relative position with re...

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Hauptverfasser:	Van Der Pasch, Engelbertus Antonius Fransiscus, Beems, Marcel Hendrikus Maria, Eussen, Emiel Jozef Melanie, Klijntunte, Engelbertus Johannes Jeroen
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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