Method for charging substrate to a potential

A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is...

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Bibliographische Detailangaben

Hauptverfasser:	Bertsche, Kirk J, McCord, Mark A
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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