Ferroelectric element and method for manufacturing the same
In a ferroelectric element, the ferroelectric film is prevented from deteriorating and the interconnect film from lowering in reliability. A ferroelectric element includes a first electrode, a ferroelectric film formed on the first electrode, a second electrode formed on the ferroelectric film, a fi...
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creator | Mitsuhashi, Toshiro |
description | In a ferroelectric element, the ferroelectric film is prevented from deteriorating and the interconnect film from lowering in reliability. A ferroelectric element includes a first electrode, a ferroelectric film formed on the first electrode, a second electrode formed on the ferroelectric film, a first hydrogen blocking film formed directly on a surface of the second electrode, a first insulation film formed on the first hydrogen blocking film, a first opening formed in the first hydrogen blocking film exposing a part of the second electrode, a second opening formed in the first insulation film and having a greater diameter than the diameter of the first opening, and an interconnect film connected to the second electrode through the first and second openings. |
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A ferroelectric element includes a first electrode, a ferroelectric film formed on the first electrode, a second electrode formed on the ferroelectric film, a first hydrogen blocking film formed directly on a surface of the second electrode, a first insulation film formed on the first hydrogen blocking film, a first opening formed in the first hydrogen blocking film exposing a part of the second electrode, a second opening formed in the first insulation film and having a greater diameter than the diameter of the first opening, and an interconnect film connected to the second electrode through the first and second openings.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZLB2Sy0qyk_NSU0uKcpMVgAyclPzShQS81IUclNLMvJTFNLyixRyE_NK0xKTS0qLMvPSFUoyUhWKE3NTeRhY0xJzilN5oTQ3g4Kba4izh25pcUFiCdCY4vj0okQQZWBuaG5mYGxhTIQSAJLQMHk</recordid><startdate>20070213</startdate><enddate>20070213</enddate><creator>Mitsuhashi, Toshiro</creator><scope>EFH</scope></search><sort><creationdate>20070213</creationdate><title>Ferroelectric element and method for manufacturing the same</title><author>Mitsuhashi, Toshiro</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_071760383</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Mitsuhashi, Toshiro</creatorcontrib><creatorcontrib>Oki Electric Industry Co., Ltd</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Mitsuhashi, Toshiro</au><aucorp>Oki Electric Industry Co., Ltd</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Ferroelectric element and method for manufacturing the same</title><date>2007-02-13</date><risdate>2007</risdate><abstract>In a ferroelectric element, the ferroelectric film is prevented from deteriorating and the interconnect film from lowering in reliability. A ferroelectric element includes a first electrode, a ferroelectric film formed on the first electrode, a second electrode formed on the ferroelectric film, a first hydrogen blocking film formed directly on a surface of the second electrode, a first insulation film formed on the first hydrogen blocking film, a first opening formed in the first hydrogen blocking film exposing a part of the second electrode, a second opening formed in the first insulation film and having a greater diameter than the diameter of the first opening, and an interconnect film connected to the second electrode through the first and second openings.</abstract><oa>free_for_read</oa></addata></record> |
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title | Ferroelectric element and method for manufacturing the same |
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