Uniformity control multiple tilt axes, rotating wafer and variable scan velocity

A system, method and program product for enhancing dose uniformity during ion implantation are disclosed. The present invention is directed to allowing the use of an at least partially untuned ion beam to obtain a uniform implant by scanning the beam in multiple rotationally-fixed orientations (scan...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Renau, Anthony, Olson, Joseph C, Smatlak, Donna L, Lu, Jun
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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