Extreme ultraviolet pellicle using a thin film and supportive mesh

An extreme ultraviolet (EUV) pellicle including a thin film or membrane and a supportive wire mesh. The pellicle allows EUV radiation to pass through the pellicle to a reticle but prevents particles from passing through the pellicle. A buffer gas supports the film against the wire mesh. The film or...

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Hauptverfasser:	Bristol, Robert, Rice, Bryan J
Format:	Patent
Sprache:	eng
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creator	Bristol, Robert Rice, Bryan J
description	An extreme ultraviolet (EUV) pellicle including a thin film or membrane and a supportive wire mesh. The pellicle allows EUV radiation to pass through the pellicle to a reticle but prevents particles from passing through the pellicle. A buffer gas supports the film against the wire mesh. The film or membrane may be embedded with support fibers or beams.
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title	Extreme ultraviolet pellicle using a thin film and supportive mesh
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