Control of stress in metal films by controlling the atmosphere during film deposition

−7 −6 −6 Materials such as titanium are vapor-deposited in the presence of, e.g., oxygen to form a film on a substrate, such as to provide an adhesion layer between a silicon movable structure in an optical MEMS device and a gold layer serving as a reflecting surface. The resulting film contains tit...

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Bibliographische Detailangaben

Hauptverfasser:	Bailey, James F, Chan, Ho Bun, Gomez, Louis T, Haueis, Martin
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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