Positive photoresist compositions having enhanced processing time

Positive photoresist compositions having enhanced processing time

Novel compositions comprising photoactive polymers comprising a dinitrobenzyl group in conjunction with a photoacid generator are disclosed. In one embodiment, the photoacid generator is a diazide and/or a sulfonyl aceto carbonyl compound. The photoacid generators are typically used in amounts of 10...

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Hauptverfasser: Jones, James E, Campbell, Randal L, Diehl, David A, Maksimovic, Ljiljana, Ambrose, Ronald R, Gruber, Gerald W
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Sprache:eng
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creator Jones, James E
Campbell, Randal L
Diehl, David A
Maksimovic, Ljiljana
Ambrose, Ronald R
Gruber, Gerald W
description Novel compositions comprising photoactive polymers comprising a dinitrobenzyl group in conjunction with a photoacid generator are disclosed. In one embodiment, the photoacid generator is a diazide and/or a sulfonyl aceto carbonyl compound. The photoacid generators are typically used in amounts of 10 weight percent or less. The compositions find particular application in storage stable, pH stable, and water stable positive photoresist compositions. Such compositions demonstrate reduced process time as compared with similar compositions lacking the photoacid generator. Methods for using these compositions are also disclosed.
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In one embodiment, the photoacid generator is a diazide and/or a sulfonyl aceto carbonyl compound. The photoacid generators are typically used in amounts of 10 weight percent or less. The compositions find particular application in storage stable, pH stable, and water stable positive photoresist compositions. Such compositions demonstrate reduced process time as compared with similar compositions lacking the photoacid generator. 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In one embodiment, the photoacid generator is a diazide and/or a sulfonyl aceto carbonyl compound. The photoacid generators are typically used in amounts of 10 weight percent or less. The compositions find particular application in storage stable, pH stable, and water stable positive photoresist compositions. Such compositions demonstrate reduced process time as compared with similar compositions lacking the photoacid generator. Methods for using these compositions are also disclosed.</abstract><oa>free_for_read</oa></addata></record>
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title Positive photoresist compositions having enhanced processing time
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