System and method for multi-wafer scanning in ion implanters

ds=√{square root over (D−(w−D))}2QwDw+OS Methods and systems are provided for increasing the efficiency of the ion beam during scanning workpieces in ion implanting such that multiple wafers are arranged on a platen or support so that a greater portion of the beam scans the workpiece surface. Specif...

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Bibliographische Detailangaben

Hauptverfasser:	Sheng, Alan P, Riordon, Benjamin B, Ficarra, Lawrence M
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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