Method for determining layer thickness ranges
The invention concerns a method for the determination of layer thickness ranges of layers of a specimen, in which the reflection spectrum of the specimen is measured in a specified wavelength range and then smoothed, the number of extremes in the smoothed reflection spectrum is determined, and the d...
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| creator | Mikkelsen, Hakon Wienecke, Joachim |
| description | The invention concerns a method for the determination of layer thickness ranges of layers of a specimen, in which the reflection spectrum of the specimen is measured in a specified wavelength range and then smoothed, the number of extremes in the smoothed reflection spectrum is determined, and the determination of the layer thickness ranges is accomplished by comparison with the number of extremes in the modeled reflection spectra, such that for each layer the thickness in that layer is varied in steps having a predetermined increment, and a reflection spectrum is modeled. In a method of this kind, the wavelength range and the increments are specified in self-consistent fashion using a sensitivity criterion. |
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| fullrecord | <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_06985237</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>06985237</sourcerecordid><originalsourceid>FETCH-uspatents_grants_069852373</originalsourceid><addsrcrecordid>eNrjZND1TS3JyE9RSMsvUkhJLUktys3My8xLV8hJrEwtUijJyEzOzkstLlYoSsxLTy3mYWBNS8wpTuWF0twMCm6uIc4euqXFBYklqXklxfHpQJVAysDM0sLUyNjcmAglALRFK1k</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method for determining layer thickness ranges</title><source>USPTO Issued Patents</source><creator>Mikkelsen, Hakon ; Wienecke, Joachim</creator><creatorcontrib>Mikkelsen, Hakon ; Wienecke, Joachim ; Leica Microsystems Jena GmbH</creatorcontrib><description>The invention concerns a method for the determination of layer thickness ranges of layers of a specimen, in which the reflection spectrum of the specimen is measured in a specified wavelength range and then smoothed, the number of extremes in the smoothed reflection spectrum is determined, and the determination of the layer thickness ranges is accomplished by comparison with the number of extremes in the modeled reflection spectra, such that for each layer the thickness in that layer is varied in steps having a predetermined increment, and a reflection spectrum is modeled. In a method of this kind, the wavelength range and the increments are specified in self-consistent fashion using a sensitivity criterion.</description><language>eng</language><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6985237$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,776,798,881,64015</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6985237$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Mikkelsen, Hakon</creatorcontrib><creatorcontrib>Wienecke, Joachim</creatorcontrib><creatorcontrib>Leica Microsystems Jena GmbH</creatorcontrib><title>Method for determining layer thickness ranges</title><description>The invention concerns a method for the determination of layer thickness ranges of layers of a specimen, in which the reflection spectrum of the specimen is measured in a specified wavelength range and then smoothed, the number of extremes in the smoothed reflection spectrum is determined, and the determination of the layer thickness ranges is accomplished by comparison with the number of extremes in the modeled reflection spectra, such that for each layer the thickness in that layer is varied in steps having a predetermined increment, and a reflection spectrum is modeled. In a method of this kind, the wavelength range and the increments are specified in self-consistent fashion using a sensitivity criterion.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZND1TS3JyE9RSMsvUkhJLUktys3My8xLV8hJrEwtUijJyEzOzkstLlYoSsxLTy3mYWBNS8wpTuWF0twMCm6uIc4euqXFBYklqXklxfHpQJVAysDM0sLUyNjcmAglALRFK1k</recordid><startdate>20060110</startdate><enddate>20060110</enddate><creator>Mikkelsen, Hakon</creator><creator>Wienecke, Joachim</creator><scope>EFH</scope></search><sort><creationdate>20060110</creationdate><title>Method for determining layer thickness ranges</title><author>Mikkelsen, Hakon ; Wienecke, Joachim</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_069852373</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2006</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Mikkelsen, Hakon</creatorcontrib><creatorcontrib>Wienecke, Joachim</creatorcontrib><creatorcontrib>Leica Microsystems Jena GmbH</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Mikkelsen, Hakon</au><au>Wienecke, Joachim</au><aucorp>Leica Microsystems Jena GmbH</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method for determining layer thickness ranges</title><date>2006-01-10</date><risdate>2006</risdate><abstract>The invention concerns a method for the determination of layer thickness ranges of layers of a specimen, in which the reflection spectrum of the specimen is measured in a specified wavelength range and then smoothed, the number of extremes in the smoothed reflection spectrum is determined, and the determination of the layer thickness ranges is accomplished by comparison with the number of extremes in the modeled reflection spectra, such that for each layer the thickness in that layer is varied in steps having a predetermined increment, and a reflection spectrum is modeled. In a method of this kind, the wavelength range and the increments are specified in self-consistent fashion using a sensitivity criterion.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| source | USPTO Issued Patents |
| title | Method for determining layer thickness ranges |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-23T18%3A35%3A10IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Mikkelsen,%20Hakon&rft.aucorp=Leica%20Microsystems%20Jena%20GmbH&rft.date=2006-01-10&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E06985237%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |